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Micro-arcing instability in RF PECVD plasma system

Yin, Yongbai; Bilek, Marcela; McKenzie, David R.; Charles, Christine; Boswell, Roderick

Description

Microarcing at the chamber wall in RF plasma is studied in PECVD type system. A Langmuir probe is used to measure the plasma potential. This system and procedure allows us to create reproducibly microarcings by increasing the plasma potential. The wall arcing threshold of the plasma potential in this system is in the vicinity of 50 V. In this system, the charging process, which is about a few tens of milliseconds or more, is much slower compared to the microsecond discharge. The time constant...[Show more]

CollectionsANU Research Publications
Date published: 2005
Type: Journal article
URI: http://hdl.handle.net/1885/83192
Source: Surface and Coatings Technology
DOI: 10.1016/j.surfcoat.2004.10.089

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