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The influence of crystal orientation on surface passivation in multi-crystalline silicon

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Sio, Hang Cheong (Kelvin); Phang, Sieu Pheng; Wan, Yimao; Liang, Wensheng; Trupke, T; Cao, Sheng; Hu, Dongli; Wan, Yuepeng; MacDonald, Daniel

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We present an approach to study the variation of the surface recombination velocity in multi-crystalline silicon wafers through photoluminescence imaging for thin, passivated and mirror polished wafers. The influence of crystal orientation on surface pass

CollectionsANU Research Publications
Date published: 2013
Type: Conference paper
URI: http://hdl.handle.net/1885/82699
Source: Conference Record of the IEEE Photovoltaic Specialists Conference
DOI: 10.1109/PVSC.2013.6744486

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