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A Novel Silicon Texturization Method Based on Etching Through a Silicon Nitride Mask

Weber, Klaus; Blakers, Andrew

Description

We present a new texturing technique applicable to silicon solar cells. The technique is based on the isotropic etching of silicon through a very thin layer of silicon nitride, deposited by low-pressure chemical vapor deposition. Spectrophotometry measurements show that the resulting surface texture displays low reflectivity after encapsulation behind glass, and nearly ideal light-trapping behaviour. The surfaces can also be well passivated using standard passivation techniques. Emitter dark...[Show more]

CollectionsANU Research Publications
Date published: 2005
Type: Journal article
URI: http://hdl.handle.net/1885/82583
Source: Progress in Photovoltaics: Research and Applications
DOI: 10.1002/pip.632

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