Weber, Klaus; Blakers, Andrew
We present a new texturing technique applicable to silicon solar cells. The technique is based on the isotropic etching of silicon through a very thin layer of silicon nitride, deposited by low-pressure chemical vapor deposition. Spectrophotometry measurements show that the resulting surface texture displays low reflectivity after encapsulation behind glass, and nearly ideal light-trapping behaviour. The surfaces can also be well passivated using standard passivation techniques. Emitter dark...[Show more]
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