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Thickness-dependent Stress in Plasma-deposited Silicon Dioxide Films

Au, Vicky; Charles, Christine; Bulla, Douglas; Love, John; Boswell, Roderick

Description

Thick silicon dioxide (SiO2) films up to 5 μm have been deposited by helicon activated reactive evaporation (plasma assisted deposition with electron beam evaporation source) as both bilayer and trilayer structures, and the film stress was investigated i

dc.contributor.authorAu, Vicky
dc.contributor.authorCharles, Christine
dc.contributor.authorBulla, Douglas
dc.contributor.authorLove, John
dc.contributor.authorBoswell, Roderick
dc.date.accessioned2015-12-13T22:45:33Z
dc.date.available2015-12-13T22:45:33Z
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/1885/79836
dc.description.abstractThick silicon dioxide (SiO2) films up to 5 μm have been deposited by helicon activated reactive evaporation (plasma assisted deposition with electron beam evaporation source) as both bilayer and trilayer structures, and the film stress was investigated i
dc.publisherAmerican Institute of Physics (AIP)
dc.sourceJournal of Applied Physics
dc.subjectKeywords: Buffer layers; Film deposition; Helicon activated reactive evaporation (HARE); Waveguide fabrication; Birefringence; Coalescence; Electron beams; Evaporation; Film growth; Interfaces (materials); Nanostructured materials; Optical waveguides; Photoluminesc
dc.titleThickness-dependent Stress in Plasma-deposited Silicon Dioxide Films
dc.typeJournal article
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.citationvolume97
dc.date.issued2005
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matter
local.identifier.ariespublicationMigratedxPub8210
local.type.statusPublished Version
local.contributor.affiliationAu, Vicky, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBulla, Douglas, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLove, John, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.bibliographicCitation.issue8
local.bibliographicCitation.startpage084912-1-7
local.identifier.doi10.1063/1.1870116
dc.date.updated2015-12-11T10:23:42Z
local.identifier.scopusID2-s2.0-21444432726
CollectionsANU Research Publications

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