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Low-loss Silica-based Optical Film Waveguides Deposited by Helicon-activated Reactive Evaporation

Bulla, Douglas; Li, Wei; Charles, Christine; Boswell, Roderick; Ankiewicz, Adrian; Love, John

Description

Planar silica-based optical waveguides have been deposited by a plasma helicon-activated reactive evaporation system, at a low temperature and with reduced hydrogen contamination, on thermally oxidized silicon wafers. The transmission loss of the rib waveguides, formed on the deposited films by etching with hydrofluoric acid, is determined to be lower than 0.1 and 0.7 dB/cm at wavelengths of 1310 and 1510 nm, respectively, for TE polarization. The influence of substrate leakage on propagation...[Show more]

dc.contributor.authorBulla, Douglas
dc.contributor.authorLi, Wei
dc.contributor.authorCharles, Christine
dc.contributor.authorBoswell, Roderick
dc.contributor.authorAnkiewicz, Adrian
dc.contributor.authorLove, John
dc.date.accessioned2015-12-13T22:45:32Z
dc.date.available2015-12-13T22:45:32Z
dc.identifier.issn0733-8724
dc.identifier.urihttp://hdl.handle.net/1885/79835
dc.description.abstractPlanar silica-based optical waveguides have been deposited by a plasma helicon-activated reactive evaporation system, at a low temperature and with reduced hydrogen contamination, on thermally oxidized silicon wafers. The transmission loss of the rib waveguides, formed on the deposited films by etching with hydrofluoric acid, is determined to be lower than 0.1 and 0.7 dB/cm at wavelengths of 1310 and 1510 nm, respectively, for TE polarization. The influence of substrate leakage on propagation loss is determined numerically and compared with experimental results for TE and TM polarizations. The presence of the OH vibrational overtone band in the fabricated waveguides, at a wavelength of around 1385 nm, is discussed in terms of the waveguide structure.
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE Inc)
dc.sourceJournal of Lightwave Technology
dc.subjectKeywords: Birefringence; Etching; Hydrofluoric acid; Light polarization; Light propagation; Light transmission; Numerical analysis; Optical films; Plasma enhanced chemical vapor deposition; Refractive index; Silica; Silicon wafers; Helicon activated reactive evapor Dielectric waveguides; Optical planar waveguides and optical losses; Plasma CVD
dc.titleLow-loss Silica-based Optical Film Waveguides Deposited by Helicon-activated Reactive Evaporation
dc.typeJournal article
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.citationvolume23
dc.date.issued2005
local.identifier.absfor020501 - Classical and Physical Optics
local.identifier.ariespublicationMigratedxPub8209
local.type.statusPublished Version
local.contributor.affiliationBulla, Douglas, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLi, Wei, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationCharles, Christine, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBoswell, Roderick, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationAnkiewicz, Adrian, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLove, John, College of Physical and Mathematical Sciences, ANU
local.bibliographicCitation.issue3
local.bibliographicCitation.startpage1302
local.bibliographicCitation.lastpage1307
local.identifier.doi10.1109/JLT.2005.843482
dc.date.updated2015-12-11T10:23:42Z
local.identifier.scopusID2-s2.0-18144370064
CollectionsANU Research Publications

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