Patterning of hafnia and titania via gas-phase soft lithography combined with atomic layer deposition
Novel titania and hafnia structures on top of silica wafer were produced using atomic layer deposition through the accessible pores created by a patterned polydimethylsiloxane (PDMS) stamp in conformal contact. Typically, the processing temperature was in
|Collections||ANU Research Publications|
|Source:||Applied Surface Science|
|01_Notley_Patterning_of_hafnia_and_2013.pdf||1.61 MB||Adobe PDF||Request a copy|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.