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Patterning of hafnia and titania via gas-phase soft lithography combined with atomic layer deposition

Notley, Shannon; Fogden, Andrew

Description

Novel titania and hafnia structures on top of silica wafer were produced using atomic layer deposition through the accessible pores created by a patterned polydimethylsiloxane (PDMS) stamp in conformal contact. Typically, the processing temperature was in

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
URI: http://hdl.handle.net/1885/75440
Source: Applied Surface Science
DOI: 10.1016/j.apsusc.2013.08.040

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