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Electrical properties of atomic layer deposited Al 2 O 3 with anneal temperature for surface passivation

Suh, Dong Chul; Liang, Wensheng


The electrical characteristics of Al2O3 layers prepared by the atomic layer deposition technique using O3, H 2O, and plasma O2, as oxidants are investigated through capacitance-voltage measurements of metal-insulator-semiconductor capacitors. Particular e

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
Source: Thin Solid Films
DOI: 10.1016/j.tsf.2013.05.082


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