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Surface passivation of crystalline silicon by sputter deposited hydrogenated amorphous silicon

Zhang, Xinyu; Hargreaves, Stuart; Wan, Yimao; Cuevas, Andres

Description

This letter shows that intrinsic hydrogenated amorphous silicon (a-Si:H) films deposited by RF magnetron sputtering can provide outstanding passivation of crystalline silicon surfaces, similar to that achieved by plasma enhanced chemical vapour deposition (PECVD). By using a 2% hydrogen and 98% argon gas mixture as the plasma source, 1.5 Ω cm n-type FZ silicon wafers coated with sputtered a-Si:H films achieved an effective lifetime of 3.5 ms, comparable to the 3 ms achieved by PECVD (RF and...[Show more]

CollectionsANU Research Publications
Date published: 2014
Type: Journal article
URI: http://hdl.handle.net/1885/73759
Source: Physica Status Solidi: Rapid Research Letters
DOI: 10.1002/pssr.201308253

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