Photo-induced and thermal annealing of chalcogenide films for waveguide fabrication
We describe the effect of light-induced annealing of As2S 3 thin films and its impact on the performance of an optical waveguide. An as-deposited film was subjected to illumination with band-edge light before being used to fabricate submicron thick waveguides using photolithography and dry plasma etching. Studies of the film microstructure revealed a difference between the atomic bonds and linked phases between the as-deposited, the thermally-annealed, and the optically-annealed films. Although...[Show more]
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