Metallic surface doping of SiO x nanowires
Utilising active oxidation processes at higher temperatures and low O 2 partial pressures, a dense layer of sub-stoichiometric silica nanowires can be readily fabricated directly from an underlying metal coated Si substrate. These unique surfaces are thermally and chemically robust, providing an ideal supporting substrate for secondary materials for a range of applications, including photocatalysis and sensing. In this report we discuss methods to incorporate volume and surface metallic dopants...[Show more]
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|Source:||International Journal of Nanotechnology|
|01_Shalav_Metallic_surface_doping_of_SiO_2014.pdf||2.62 MB||Adobe PDF||Request a copy|
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