Amorphous silicon passivated contacts for diffused junction silicon solar cells
Carrier recombination at the metal contacts is a major obstacle in the development of high-performance crystalline silicon homojunction solar cells. To address this issue, we insert thin intrinsic hydrogenated amorphous silicon [a-Si:H(i)] passivating films between the dopant-diffused silicon surface and aluminum contacts. We find that with increasing a-Si:H(i) interlayer thickness (from 0 to 16 nm) the recombination loss at metal-contacted phosphorus (n +) and boron (p+) diffused surfaces...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Applied Physics|
|01_Bullock_Amorphous_silicon_passivated_2014.pdf||2.2 MB||Adobe PDF||Request a copy|
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