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Process control of reactive sputter deposition of AlO x and improved surface passivation of crystalline silicon

Zhang, Xinyu; Cuevas, Andres; Thomson, Andrew

Description

In this paper, we investigate the relationship between the deposition-process parameters of reactively sputtered aluminium oxide films and the passivation of silicon surfaces. A method of tuning the deposition process has been established that results in

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
URI: http://hdl.handle.net/1885/69866
Source: IEEE Journal of Photovoltaics
DOI: 10.1109/JPHOTOV.2012.2214765

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