Skip navigation
Skip navigation

Process control of reactive sputter deposition of AlO x and improved surface passivation of crystalline silicon

Zhang, Xinyu; Cuevas, Andres; Thomson, Andrew


In this paper, we investigate the relationship between the deposition-process parameters of reactively sputtered aluminium oxide films and the passivation of silicon surfaces. A method of tuning the deposition process has been established that results in

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
Source: IEEE Journal of Photovoltaics
DOI: 10.1109/JPHOTOV.2012.2214765


File Description SizeFormat Image
01_Zhang_Process_control_of_reactive_2013.pdf814.04 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator