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Model surfaces produced by atomic layer deposition

Walsh, Rick; Howard, Shaun; Nelson, Andrew; Skinner, William Menelaos; Liu, Guangming; Craig, Vincent

Description

Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films.

CollectionsANU Research Publications
Date published: 2012
Type: Journal article
URI: http://hdl.handle.net/1885/68657
Source: Chemistry Letters
DOI: 10.1246/cl.2012.1247

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