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Structural, Compositional and Optical properties of PECVD silicon nitride layers

Karouta, Fouad; Vora, Kaushal; Tian, Jie; Jagadish, Chennupati

Description

We have investigated the correlation between the various plasma-enhanced chemical vapour deposition (PECVD) process parameters on the structural, compositional and optical properties of SiNx layers. The investigated process parameters are gas composition, radio frequency power and its frequency and deposition temperature. We also investigated SiON and ammonia-free SiNx layers. Refractive index, thickness, residual stress, structure and composition of the dielectric layers were determined using...[Show more]

CollectionsANU Research Publications
Date published: 2012
Type: Journal article
URI: http://hdl.handle.net/1885/67324
Source: Journal of Physics D: Applied Physics
DOI: 10.1088/0022-3727/45/44/445301

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