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Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films

Mangalampalli, S.R.N. Kiran; Krishna, Ghanashyam; Padmanabhan, K.A.


Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nan

CollectionsANU Research Publications
Date published: 2011
Type: Journal article
Source: Solid State Communications
DOI: 10.1016/j.ssc.2011.01.009


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