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Structural and mechanical properties of room temperature sputter deposited CrN coatings

Thulasi Raman, K.H.; Mangalampalli, S.R.N. Kiran; Ramamurty, U; Rao, G. Mohan


Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates using DC reactive magnetron sputtering in Ar + N2 plasma. Structure and mechanical properties of these films were examined by using XRD, FESEM and nanoindentation techniques. XRD studies revealed that films are of mixed phase at lower nitrogen partial pressure (PN2) and single phase at higher (PN2). Microscopy results show that the films were composed of non-equiaxed columns with nanocrystallite...[Show more]

CollectionsANU Research Publications
Date published: 2012
Type: Journal article
Source: Materials Research Bulletin
DOI: 10.1016/j.materresbull.2012.09.051


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