Skip navigation
Skip navigation

Structural and mechanical properties of room temperature sputter deposited CrN coatings

Thulasi Raman, K.H.; Mangalampalli, S.R.N. Kiran; Ramamurty, U; Rao, G. Mohan

Description

Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates using DC reactive magnetron sputtering in Ar + N2 plasma. Structure and mechanical properties of these films were examined by using XRD, FESEM and nanoindentation techniques. XRD studies revealed that films are of mixed phase at lower nitrogen partial pressure (PN2) and single phase at higher (PN2). Microscopy results show that the films were composed of non-equiaxed columns with nanocrystallite...[Show more]

CollectionsANU Research Publications
Date published: 2012
Type: Journal article
URI: http://hdl.handle.net/1885/66580
Source: Materials Research Bulletin
DOI: 10.1016/j.materresbull.2012.09.051

Download

File Description SizeFormat Image
01_Thulasi Raman_Structural_and_mechanical_2012.pdf2.03 MBAdobe PDF    Request a copy
02_Thulasi Raman_Structural_and_mechanical_2012.pdf734.36 kBAdobe PDF    Request a copy


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator