Thulasi Raman, K.H.; Mangalampalli, S.R.N. Kiran; Ramamurty, U; Rao, G. Mohan
Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates using DC reactive magnetron sputtering in Ar + N2 plasma. Structure and mechanical properties of these films were examined by using XRD, FESEM and nanoindentation techniques. XRD studies revealed that films are of mixed phase at lower nitrogen partial pressure (PN2) and single phase at higher (PN2). Microscopy results show that the films were composed of non-equiaxed columns with nanocrystallite...[Show more]
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