Structure and mechanical properties of TiC films deposited using combination of pulsed DC and normal DC magnetron co-sputtering
Titanium-carbon (TiC) thin films of different compositions were prepared by a combination of pulsed DC (for Ti target) and normal DC (for graphite target) magnetron co-sputtering on oxidized silicon and fused quartz substrates. At 33.7 at.% of C content,
|Collections||ANU Research Publications|
|Source:||Applied Surface Science|
|01_Thulasi Raman_Structure_and_mechanical_2012.pdf||2.03 MB||Adobe PDF||Request a copy|
|02_Thulasi Raman_Structure_and_mechanical_2012.pdf||2.06 MB||Adobe PDF||Request a copy|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.