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Single-step RIE fabrication process of low loss InP waveguide using CH 4 /H 2 chemistry

Lysevych, Mykhaylo; Tan, Hoe Hark; Karouta, Fouad; Jagadish, Chennupati

Description

Single-step C H4 / H2 -based reactive ion etching (RIE) process, without alternating O2 plasma treatment, has been developed with virtually no polymer buildup on the etched surface. InP ridge waveguides up to 1.9 μm high were etched without any mid- or p

CollectionsANU Research Publications
Date published: 2011
Type: Journal article
URI: http://hdl.handle.net/1885/66502
Source: Journal of the Electrochemical Society
DOI: 10.1149/1.3532767

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