Nanostructuring of InP by colloidal lithography and ICP etching for photovoltaic applications
We demonstrate a simple and cost effective method to fabricate InP nanopillars using silica particles as masks for etching InP. Oxygen plasma treatment of InP surfaces before dispersion of colloidal mask particles improved surface wettability significantly and helped in uniform coverage of the particles over large areas. Pillars with varied sizes were fabricated by dispersing colloidal SiO2 with different sizes on the sample and/or by reducing size of particles after dispersion. Nanopillars...[Show more]
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|Source:||Conference Proceedings - International Conference on Indium Phosphide and Related Materials|
|01_Naureen_Nanostructuring_of_InP_by_2011.pdf||660.51 kB||Adobe PDF||Request a copy|
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