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Improved resistive switching properties in Ti/TiOx /La0.7 Ca0.3 MnO3 /Pt stacked structures

Liu, Xinjun; Li, Xiaomin; Wang, Qun; Yu, Weidong; Yang, Rui; Cao, Xun; Gao, Xiangdong; Chen, Lidong

Description

A TiOx layer (∼ 20 nm) was designed and introduced by a pulse laser deposition method to simulate the TiOx layer that developed naturally when the Ti top electrode was deposited on a La0.7Ca0.3MnO3 (LCMO) film. Comparing Ti/LCMO/Pt structures with those

CollectionsANU Research Publications
Date published: 2010
Type: Journal article
URI: http://hdl.handle.net/1885/65587
Source: Solid State Communications
DOI: 10.1016/j.ssc.2009.09.032

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