Improved resistive switching properties in Ti/TiOx /La0.7 Ca0.3 MnO3 /Pt stacked structures
A TiOx layer (∼ 20 nm) was designed and introduced by a pulse laser deposition method to simulate the TiOx layer that developed naturally when the Ti top electrode was deposited on a La0.7Ca0.3MnO3 (LCMO) film. Comparing Ti/LCMO/Pt structures with those
|Collections||ANU Research Publications|
|Source:||Solid State Communications|
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