Fabrication of submicrometer InP pillars by colloidal lithography and dry etching
A simple method for the fabrication of submicrometer InP pillars with large surface area coverage has been developed based on a combination of colloidal lithography and inductively coupled plasma (ICP) etching technique using Cl 2/H2/CH4/Ar chemistry. Pillars with different sizes could be fabricated by using colloidal SiO2 particles with different sizes dispersed on the sample serving as masks. Pillars with lateral diameters as small as 60 nm and aspect ratios as high as 10:1 have been...[Show more]
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|Source:||Journal of the Electrochemical Society|
|01_Li_Fabrication_of_submicrometer_2010.pdf||294.46 kB||Adobe PDF||Request a copy|
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