Skip navigation
Skip navigation

Fabrication of submicrometer InP pillars by colloidal lithography and dry etching

Li, Mingyu; Naureen, Shagufta; Shahid, Naeem; Anand, S

Description

A simple method for the fabrication of submicrometer InP pillars with large surface area coverage has been developed based on a combination of colloidal lithography and inductively coupled plasma (ICP) etching technique using Cl 2/H2/CH4/Ar chemistry. Pillars with different sizes could be fabricated by using colloidal SiO2 particles with different sizes dispersed on the sample serving as masks. Pillars with lateral diameters as small as 60 nm and aspect ratios as high as 10:1 have been...[Show more]

CollectionsANU Research Publications
Date published: 2010
Type: Journal article
URI: http://hdl.handle.net/1885/65267
Source: Journal of the Electrochemical Society
DOI: 10.1149/1.3464764

Download

File Description SizeFormat Image
01_Li_Fabrication_of_submicrometer_2010.pdf294.46 kBAdobe PDF    Request a copy


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  20 July 2017/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator