Rapid thermal annealing of Ti-rich TiNi thin films: A new approach to fabricate patterned shape memory thin films
This paper reports the rapid thermal annealing (RTA) of Ti-rich TiNi thin films, synthesized by the co-sputtering of TiNi and Ti targets. Long-range order of aperiodic alloy could be achieved in a few seconds with the optimum temperature of 773. K. Longer annealing (773. K/240. s), transformed the film to a poorly ordered vitreous phase, suggesting a novel method for solid state amorphization. Reitveld refinement analyses showed significant differences in structural parameters of the films...[Show more]
|Collections||ANU Research Publications|
|Source:||Materials and Design|
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