Novel postetch process to realize high quality photonic crystals in InP
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Shahid, Naeem; Naureen, Shagufta; Li, Mingyu; Swillo, Marcin; Anand, S
Description
Thermally driven reflow of material during annealing was positively used to obtain near-vertical sidewall profiles for high-aspect-ratio nanostructures in InP fabricated by dry etching. This is very promising for achieving high optical quality in photonic crystal (PhC) components. Nearly cylindrical profiles were obtained for high-aspect-ratio PhC holes with diameters as small as 200-350 nm. Mini stop bands (MSBs) in line-defect PhC waveguides were experimentally investigated for both as-etched...[Show more]
Collections | ANU Research Publications |
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Date published: | 2011 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/65105 |
Source: | Journal of Vacuum Science and Technology B |
DOI: | 10.1116/1.3574760 |
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01_Shahid_Novel_postetch_process_to_2011.pdf | 466.9 kB | Adobe PDF |
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