Novel postetch process to realize high quality photonic crystals in InP
Thermally driven reflow of material during annealing was positively used to obtain near-vertical sidewall profiles for high-aspect-ratio nanostructures in InP fabricated by dry etching. This is very promising for achieving high optical quality in photonic crystal (PhC) components. Nearly cylindrical profiles were obtained for high-aspect-ratio PhC holes with diameters as small as 200-350 nm. Mini stop bands (MSBs) in line-defect PhC waveguides were experimentally investigated for both as-etched...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Vacuum Science and Technology B|
|01_Shahid_Novel_postetch_process_to_2011.pdf||466.9 kB||Adobe PDF|
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