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Novel postetch process to realize high quality photonic crystals in InP

Shahid, Naeem; Naureen, Shagufta; Li, Mingyu; Swillo, Marcin; Anand, S


Thermally driven reflow of material during annealing was positively used to obtain near-vertical sidewall profiles for high-aspect-ratio nanostructures in InP fabricated by dry etching. This is very promising for achieving high optical quality in photonic crystal (PhC) components. Nearly cylindrical profiles were obtained for high-aspect-ratio PhC holes with diameters as small as 200-350 nm. Mini stop bands (MSBs) in line-defect PhC waveguides were experimentally investigated for both as-etched...[Show more]

CollectionsANU Research Publications
Date published: 2011
Type: Journal article
Source: Journal of Vacuum Science and Technology B
DOI: 10.1116/1.3574760


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