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Nitrogen deficiency and metal dopant induced sub-stoichiometry in titanium nitride thin films: A comparative study

Kuraganti, Vasu; Mangalampalli, S.R.N. Kiran; Mamidipudi, Ghanashyam Krishna; Kuppuswamy, Anantha Padmanabhan


Sub-stoichiometric (nitrogen-deficient) and Nb-substituted (Ti 1-y Nb N, 0 ≤ y ≤ 1) titanium nitride thin films were deposited by means of radio frequency magnetron sputtering on SiO2 and Si (311) substrates and compared. Thickness of TiN films varied

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
Source: International Journal of Materials Research
DOI: 10.3139/146.110938


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