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Charge stability in LPCVD silicon nitride for surface passivation of silicon solar cells

Ren, Yongling; Nursam, Natalita; Wang, Da; Weber, Klaus


Negatively charged dielectric films are of great interest for application to silicon solar cells, since such films offer the possibility of excellent passivation of p type surfaces. This paper investigates the distribution and stability of negative charge in silicon dioxide / LPCVD silicon nitride films which have been negatively charged through the injection of electrons from the silicon substrate. High densities of negative charge (5-10×1012cm-2) can be stored in the silicon nitride films....[Show more]

CollectionsANU Research Publications
Date published: 2010
Type: Conference paper
Source: Proceedings of PVSC 2010
DOI: 10.1109/PVSC.2010.5614143


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