Charge stability in LPCVD silicon nitride for surface passivation of silicon solar cells
Negatively charged dielectric films are of great interest for application to silicon solar cells, since such films offer the possibility of excellent passivation of p type surfaces. This paper investigates the distribution and stability of negative charge in silicon dioxide / LPCVD silicon nitride films which have been negatively charged through the injection of electrons from the silicon substrate. High densities of negative charge (5-10×1012cm-2) can be stored in the silicon nitride films....[Show more]
|Collections||ANU Research Publications|
|Source:||Proceedings of PVSC 2010|
|01_Ren_Charge_stability_in_LPCVD_2010.pdf||696.17 kB||Adobe PDF||Request a copy|
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