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Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films

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Nandi, Sanjoy; Llewellyn, David; Belay, Kidane; Venkatachalam, Dinesh; Liu, Xinjun; Elliman, Robert

CollectionsANU Research Publications
Date published: 2014
Type: Journal article
URI: http://hdl.handle.net/1885/61759
Source: Microscopy and Microanalysis
DOI: 10.1017/S1431927614011659

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