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Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films

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Nandi, Sanjoy; Llewellyn, David; Belay, Kidane; Venkatachalam, Dinesh; Liu, Xinjun; Elliman, Robert

dc.contributor.authorNandi, Sanjoy
dc.contributor.authorLlewellyn, David
dc.contributor.authorBelay, Kidane
dc.contributor.authorVenkatachalam, Dinesh
dc.contributor.authorLiu, Xinjun
dc.contributor.authorElliman, Robert
dc.date.accessioned2015-12-10T23:01:50Z
dc.identifier.issn1431-9276
dc.identifier.urihttp://hdl.handle.net/1885/61759
dc.publisherCambridge University Press
dc.sourceMicroscopy and Microanalysis
dc.titleEffect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume20
dc.date.issued2014
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matter
local.identifier.ariespublicationU3594520xPUB637
local.type.statusPublished Version
local.contributor.affiliationNandi, Sanjoy, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLlewellyn, David, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBelay, Kidane, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationVenkatachalam, Dinesh, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLiu, Xinjun, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.issue3
local.identifier.doi10.1017/S1431927614011659
local.identifier.absseo970102 - Expanding Knowledge in the Physical Sciences
dc.date.updated2015-12-10T08:30:21Z
local.identifier.scopusID2-s2.0-84927948202
CollectionsANU Research Publications

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