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Sidewall slopes and roughness of SU-8 HARMST

Vora, Kaushal; Shew, B.Y.; Lochel, B.; Harvey, E.C.; Hayes, J.P.; Peele, Andrew Gareth

Description

In recent years we have investigated the feasibility of deep X-ray lithography in SU-8 as a means of fabricating very high aspect ratio and densely packed arrays of square channels. We have demonstrated how to overcome the problems in adhesion and stiction accompanying the fabrication of such high aspect ratio structures. We have also examined how to calculate the development time of these structures and how this can be used to optimize the dimensional fidelity of the resulting structures. More...[Show more]

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
URI: http://hdl.handle.net/1885/61068
Source: Microsystem Technologies
DOI: 10.1007/s00542-007-0506-y

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