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Sidewall slopes of SU-8 HARMST using deep x-ray lithography

Vora, Kaushal; Shew, B.Y.; Harvey, E.C.; Hayes, J.P.; Peele, Andrew Gareth

Description

We describe a model that predicts sidewall slope in SU-8 high aspect ratio microstructures made using x-ray lithography. Our experimental results are in accordance with our model and we demonstrate that essentially zero sidewall taper can be obtained under certain conditions. We use our results to explore the feasibility of optimizing a structure simultaneously for slope and surface roughness.

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
URI: http://hdl.handle.net/1885/61052
Source: Journal of Micromechanics and Microengineering
DOI: 10.1088/0960-1317/18/3/035037

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