Skip navigation
Skip navigation

Sidewall slopes of SU-8 HARMST using deep x-ray lithography

Vora, Kaushal; Shew, B.Y.; Harvey, E.C.; Hayes, J.P.; Peele, Andrew Gareth


We describe a model that predicts sidewall slope in SU-8 high aspect ratio microstructures made using x-ray lithography. Our experimental results are in accordance with our model and we demonstrate that essentially zero sidewall taper can be obtained under certain conditions. We use our results to explore the feasibility of optimizing a structure simultaneously for slope and surface roughness.

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
Source: Journal of Micromechanics and Microengineering
DOI: 10.1088/0960-1317/18/3/035037


File Description SizeFormat Image
01_Vora_Sidewall_slopes_of_SU-8_HARMST_2008.pdf621.87 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  19 May 2020/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator