Top-down Fabrication of High Quality III-V nanostructures by Monolayer Controlled Sculpting and Simultaneous Passivation
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Naureen, S; Shahid, Naeem; Sanatinia, Reza; Anand, S
Description
In the fabrication of III-V semiconductor nanostructures for electronic and optoelectronic devices, techniques that are capable of removing material with monolayer precision are as important as material growth to achieve best device performances. A robust chemical treatment is demonstrated using sulfur (S)-oleylamine (OA) solution, which etches layer by layer in an inverse epitaxial fashion and simultaneously passivates the surface. The application of this process to push the limits of top-down...[Show more]
Collections | ANU Research Publications |
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Date published: | 2013 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/60915 |
Source: | Advanced Functional Materials |
DOI: | 10.1002/adfm.201202201 |
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01_Naureen_Top-down_Fabrication_of_High_2013.pdf | 1.67 MB | Adobe PDF | Request a copy |
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