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Nanostencil Lithography for fabrication of III-V nanostructures

Vora, Kaushal; Karouta, Fouad; Jagadish, Chennupati

Description

Nanostencil Lithography (NStL), while comparatively still in infant stages, is proving to be a viable option for low-cost and high resolution fabrication. An ideal stencil for NStL consists of a low-stressed silicon nitride membrane supported on a silicon

CollectionsANU Research Publications
Date published: 2013
Type: Conference paper
URI: http://hdl.handle.net/1885/60872
Source: Proceedings of SPIE - The International Society for Optical Engineering
DOI: 10.1117/12.2022609

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