Skip navigation
Skip navigation

Determination of thickness and composition of high-k dielectrics using high-energy electrons

Grande, Pedro; Vos, Maarten; Venkatachalam, Dinesh; Nandi, Sanjoy; Elliman, Robert

Description

We demonstrate the application of high-energy elastic electron backscattering to the analysis of thin (2-20 nm) HfO2 overlayers on oxidized Si substrates. The film composition and thickness are determined directly from elastic scattering peaks characteris

dc.contributor.authorGrande, Pedro
dc.contributor.authorVos, Maarten
dc.contributor.authorVenkatachalam, Dinesh
dc.contributor.authorNandi, Sanjoy
dc.contributor.authorElliman, Robert
dc.date.accessioned2015-12-10T22:58:06Z
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/1885/60696
dc.description.abstractWe demonstrate the application of high-energy elastic electron backscattering to the analysis of thin (2-20 nm) HfO2 overlayers on oxidized Si substrates. The film composition and thickness are determined directly from elastic scattering peaks characteris
dc.publisherAmerican Institute of Physics (AIP)
dc.rightsAuthor/s retain copyright
dc.sourceApplied Physics Letters
dc.subjectKeywords: Elastic electron backscattering; Film composition; High spatial resolution; High-energy electron; High-k dielectric; Medium energy; Rutherford back-scattering spectrometry; Thin film analysis; Hafnium oxides; Rutherford backscattering spectroscopy; Scanni
dc.titleDetermination of thickness and composition of high-k dielectrics using high-energy electrons
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume103
dc.date.issued2013
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matter
local.identifier.absfor020401 - Condensed Matter Characterisation Technique Development
local.identifier.ariespublicationU3594520xPUB557
local.type.statusPublished Version
local.contributor.affiliationGrande, Pedro, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationVos, Maarten, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationVenkatachalam, Dinesh, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationNandi, Sanjoy, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationElliman, Robert, College of Physical and Mathematical Sciences, ANU
local.bibliographicCitation.startpage071911/1
local.bibliographicCitation.lastpage4
local.identifier.doi10.1063/1.4818637
local.identifier.absseo970102 - Expanding Knowledge in the Physical Sciences
dc.date.updated2016-02-24T10:19:39Z
local.identifier.scopusID2-s2.0-84882438695
local.identifier.thomsonID000323769000026
dcterms.accessRightsOpen Access
CollectionsANU Research Publications

Download

File Description SizeFormat Image
01_Grande_Determination_of_thickness_and_2013.pdf1.24 MBAdobe PDF


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  19 May 2020/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator