Determination of thickness and composition of high-k dielectrics using high-energy electrons
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Grande, Pedro; Vos, Maarten; Venkatachalam, Dinesh; Nandi, Sanjoy; Elliman, Robert
Description
We demonstrate the application of high-energy elastic electron backscattering to the analysis of thin (2-20 nm) HfO2 overlayers on oxidized Si substrates. The film composition and thickness are determined directly from elastic scattering peaks characteris
Collections | ANU Research Publications |
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Date published: | 2013 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/60696 |
Source: | Applied Physics Letters |
DOI: | 10.1063/1.4818637 |
Access Rights: | Open Access |
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01_Grande_Determination_of_thickness_and_2013.pdf | 1.24 MB | Adobe PDF |
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