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Determination of thickness and composition of high-k dielectrics using high-energy electrons

Grande, Pedro; Vos, Maarten; Venkatachalam, Dinesh; Nandi, Sanjoy; Elliman, Robert

Description

We demonstrate the application of high-energy elastic electron backscattering to the analysis of thin (2-20 nm) HfO2 overlayers on oxidized Si substrates. The film composition and thickness are determined directly from elastic scattering peaks characteris

CollectionsANU Research Publications
Date published: 2013
Type: Journal article
URI: http://hdl.handle.net/1885/60696
Source: Applied Physics Letters
DOI: 10.1063/1.4818637

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