Non-linear direct-write lithography for semiconductor nanowire characterisation
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Parkinson, Patrick; Peng, Kun; Jiang, Nian; Gao, Qiang; Jagadish, Chennupati; Tan, Hark Hoe
Description
A non-linear photolithography technique is presented, providing a new, rapid and damage-free method of contacting semiconductor nanowires. In addition, by using nanowires with room-temperature luminescence, a through-resist photoluminescence step provides a verifiable route to contacting high-quality wires [1].
Collections | ANU Research Publications |
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Date published: | 2012 |
Type: | Conference paper |
URI: | http://hdl.handle.net/1885/59878 |
Source: | COMMAD 2012 Proceedings |
DOI: | 10.1109/COMMAD.2012.6472397 |
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01_Parkinson_Non-linear_direct-write_2012.pdf | 281.71 kB | Adobe PDF | Request a copy |
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