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Non-linear direct-write lithography for semiconductor nanowire characterisation

Parkinson, Patrick; Peng, Kun; Jiang, Nian; Gao, Qiang; Jagadish, Chennupati; Tan, Hark Hoe


A non-linear photolithography technique is presented, providing a new, rapid and damage-free method of contacting semiconductor nanowires. In addition, by using nanowires with room-temperature luminescence, a through-resist photoluminescence step provides a verifiable route to contacting high-quality wires [1].

CollectionsANU Research Publications
Date published: 2012
Type: Conference paper
Source: COMMAD 2012 Proceedings
DOI: 10.1109/COMMAD.2012.6472397


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