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Fabrication of coaxial nanawire heterostructures: S i O x nanowires with conformal T i O 2 coatings

Shalav, Avi; Venkatachalam, Dinesh; Elliman, Robert

Description

Silica nanowires, grown via the active oxidation of a silicon substrate, have been coated with TiO2 using two coating methods: solution-based deposition of Ti-alkoxides and atomic layer deposition. Analysis of as-deposited and annealed films shows that it is possible to produce stable conformal coatings of either the anatase or rutile phases of TiO2 on nanowires with diameters greater than 100 nm when annealed between 500-600°C and 800-900°C, respectively, with annealing at higher temperatures...[Show more]

CollectionsANU Research Publications
Date published: 2012
Type: Journal article
URI: http://hdl.handle.net/1885/59557
Source: Applied Physics A: Materials Science and Processing
DOI: 10.1007/s00339-012-6804-y

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