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Wafer surface charge reversal as a method of simplifying nanosphere lithography for RIE texturing of solar cells

Inns, Daniel; Campbell, Patrick; Catchpole, Kylie

Description

A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surface charge is applied to a wafer surface by dipping in a

CollectionsANU Research Publications
Date published: 2007
Type: Journal article
URI: http://hdl.handle.net/1885/59068
Source: Advances in OptoElectronics
DOI: 10.1155/2007/32707

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