Effect of substrate on hydrogen in and out diffusion from a-Si : H thin films
We present a detailed study on the effect of the substrate on the structure and hydrogen evolution from p-type hydrogenated amorphous silicon thin films co-deposited on the grounded and RF electrodes of an asymmetric radio frequency glow discharge reactor, as well as the similar films exposed to an hydrogen plasma. We used spectroscopic ellipsometry and hydrogen evolution measurements to analyze the effects of the substrate, ion energy and hydrogen plasma on the films microstructure, thickness,...[Show more]
|Collections||ANU Research Publications|
|Source:||Journal of Materials Science: Materials in Electronics|
|01_Rao_Effect_of_substrate_on_2007.pdf||566.94 kB||Adobe PDF||Request a copy|
Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.