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Degradation of SI-SIO2 interfaces during rapid thermal annealing

dc.contributor.authorKho, Teng
dc.contributor.authorBlack, Lachlan
dc.contributor.authorMcIntosh, Keith
dc.coverage.spatialHamburg Germany
dc.date.accessioned2015-12-10T22:42:55Z
dc.date.createdSeptember 21-24 2009
dc.identifier.isbn3936338256
dc.identifier.urihttp://hdl.handle.net/1885/57993
dc.publisherWIP-Renewable Energies
dc.relation.ispartofseriesEuropean Photovoltaic Solar Energy Conference 2009
dc.sourceProceedings of the 24th European Photovoltaic Solar Energy Conference
dc.titleDegradation of SI-SIO2 interfaces during rapid thermal annealing
dc.typeConference paper
local.description.notesImported from ARIES
local.description.refereedYes
dc.date.issued2009
local.identifier.absfor090608 - Renewable Power and Energy Systems Engineering (excl. Solar Cells)
local.identifier.ariespublicationu4334215xPUB423
local.type.statusPublished Version
local.contributor.affiliationKho, Teng, College of Engineering and Computer Science, ANU
local.contributor.affiliationBlack, Lachlan, College of Engineering and Computer Science, ANU
local.contributor.affiliationMcIntosh, Keith, College of Engineering and Computer Science, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.startpage1586
local.bibliographicCitation.lastpage1590
dc.date.updated2015-12-09T11:11:12Z
CollectionsANU Research Publications

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