Influence of oxygen on the sputtering of aluminum oxide for the surface passivation of crystallinen silicon
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Li, Tsu-Tsung (Andrew); Ruffell, Simon; Tucci, Mario; Mansoulie, Yves; Samundsett, Christian; De Iullis, Simona; Serenelli, Luca; Cuevas, Andres
Description
While sputtering has been shown to be capable of depositing aluminum oxide suitable for surface passivation, the mechanisms for this are yet to be firmly established and its potential realized. In this paper, we investigate the relationships between the oxygen in the sputtering process to the resulting composition of the deposited film and the surface passivation obtained. We find that surface passivation is not strongly dependent on the bulk composition of the film. Instead the results...[Show more]
dc.contributor.author | Li, Tsu-Tsung (Andrew) | |
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dc.contributor.author | Ruffell, Simon | |
dc.contributor.author | Tucci, Mario | |
dc.contributor.author | Mansoulie, Yves | |
dc.contributor.author | Samundsett, Christian | |
dc.contributor.author | De Iullis, Simona | |
dc.contributor.author | Serenelli, Luca | |
dc.contributor.author | Cuevas, Andres | |
dc.date.accessioned | 2015-12-10T22:41:22Z | |
dc.identifier.issn | 0927-0248 | |
dc.identifier.uri | http://hdl.handle.net/1885/57868 | |
dc.description.abstract | While sputtering has been shown to be capable of depositing aluminum oxide suitable for surface passivation, the mechanisms for this are yet to be firmly established and its potential realized. In this paper, we investigate the relationships between the oxygen in the sputtering process to the resulting composition of the deposited film and the surface passivation obtained. We find that surface passivation is not strongly dependent on the bulk composition of the film. Instead the results indicate that the interfacial silicon oxide layer that forms after annealing between the aluminum oxide film and the silicon is a much more important factor; it is this combined structure of aluminum oxide, silicon oxide and silicon that is crucial for obtaining negative charges and excellent surface passivation. | |
dc.publisher | Elsevier | |
dc.source | Solar Energy Materials and Solar Cells | |
dc.subject | Keywords: Aluminum oxide films; Aluminum oxides; Bulk compositions; Combined structure; Crystalline silicons; Deposited films; Influence of oxygen; Negative charge; Silicon oxide layers; Sputtering process; Surface passivation; Aluminum; Oxide films; Oxygen; Silico Aluminum oxide; Sputtering; Surface passivation | |
dc.title | Influence of oxygen on the sputtering of aluminum oxide for the surface passivation of crystallinen silicon | |
dc.type | Journal article | |
local.description.notes | Imported from ARIES | |
local.identifier.citationvolume | 95 | |
dc.date.issued | 2011 | |
local.identifier.absfor | 090603 - Industrial Electronics | |
local.identifier.ariespublication | u4334215xPUB418 | |
local.type.status | Published Version | |
local.contributor.affiliation | Li, Tsu-Tsung (Andrew), College of Engineering and Computer Science, ANU | |
local.contributor.affiliation | Ruffell, Simon, College of Physical and Mathematical Sciences, ANU | |
local.contributor.affiliation | Tucci, Mario, ENEA Research Center Casaccia | |
local.contributor.affiliation | Mansoulie, Yves, Grand Voie des Vignes | |
local.contributor.affiliation | Samundsett, Christian, College of Engineering and Computer Science, ANU | |
local.contributor.affiliation | De Iullis, Simona, ENEA Research Center Casaccia | |
local.contributor.affiliation | Serenelli, Luca, ENEA Research Center Casaccia | |
local.contributor.affiliation | Cuevas, Andres, College of Engineering and Computer Science, ANU | |
local.description.embargo | 2037-12-31 | |
local.bibliographicCitation.issue | 1 | |
local.bibliographicCitation.startpage | 69 | |
local.bibliographicCitation.lastpage | 72 | |
local.identifier.doi | 10.1016/j.solmat.2010.03.034 | |
dc.date.updated | 2016-02-24T11:00:38Z | |
local.identifier.scopusID | 2-s2.0-78149362339 | |
local.identifier.thomsonID | 000287013800019 | |
Collections | ANU Research Publications |
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