High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography
We describe the fabrication of single-mode polarization-insensitive polysiloxane channel waveguide gratings by a single-step ultraviolet nanoimprint lithography process with a polydimethylsiloxane stamp. A 10-dB deep grating response that matches the theoretically expected response at the first-order resonant wavelength was achieved in a 2-mm-long grating with no excess loss over the intrinsic material absorption. Features down to ∼100 nm could be replicated using the soft stamp.
|Collections||ANU Research Publications|
|Source:||IEEE Photonics Technology Letters|
|01_Han_High-quality_2010.pdf||571.73 kB||Adobe PDF||Request a copy|
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