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High-quality polarization-insensitive polysiloxane waveguide gratings produced by UV nanoimprint lithography

Han, Ting; Madden, Steve; Luther-Davies, Barry; Charters, Robbie

Description

We describe the fabrication of single-mode polarization-insensitive polysiloxane channel waveguide gratings by a single-step ultraviolet nanoimprint lithography process with a polydimethylsiloxane stamp. A 10-dB deep grating response that matches the theoretically expected response at the first-order resonant wavelength was achieved in a 2-mm-long grating with no excess loss over the intrinsic material absorption. Features down to ∼100 nm could be replicated using the soft stamp.

CollectionsANU Research Publications
Date published: 2010
Type: Journal article
URI: http://hdl.handle.net/1885/57228
Source: IEEE Photonics Technology Letters
DOI: 10.1109/LPT.2010.2083645

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