Damage-free ultraviolet nanosecond laser ablation for high efficiency back contact solar cell fabrication
Selective laser ablation of dielectric films for local contact formation is an attractive process simplification for high efficiency silicon solar cell fabrication. In high efficiency applications, the goal of laser ablation is spatially selective removal of surface dielectric layer(s) with minimal modification to the electronic properties of the substrate, equivalent to the performance benchmark set by photolithography processing. In this work, we present detailed characterisation of direct,...[Show more]
|Collections||ANU Research Publications|
|Source:||Solar Energy Materials and Solar Cells|
|01_Walters_Damage-free_ultraviolet_2015.pdf||3.03 MB||Adobe PDF||Request a copy|
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