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Elasto-plastic characterisation of low-temperature plasma-deposited silicon nitride thin films using nanoindentation

Mariusz, Martyniuk; Musca, Charles Anthony; Dell, John Marcel; Elliman, Robert; Faraone, Lorenzo

Description

Nanoindentation has been utilised in order to investigate the mechanical properties of low-temperature (50-300°C) plasma-deposited SiNx thin films for applications of micro-electro-mechanical systems on temperature sensitive, non-standard substrates. It

CollectionsANU Research Publications
Date published: 2009
Type: Journal article
URI: http://hdl.handle.net/1885/54523
Source: International Journal of Surface Science and Engineering
DOI: 10.1504/IJSURFSE.2009.024359

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