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Thermal expansion coefficients and composition of sputter-deposited silicon oxynitride thin films

McKerracher, Ian; Fu, Lan; Tan, Hoe Hark; Jagadish, Chennupati


Modern technology is heavily reliant on silicon dioxide and silicon nitride thin films. These films have many electronic and optical applications, and in some cases silicon oxynitride films of intermediate composition are desirable. We have systematically deposited several SiOxNy films by magnetron sputter deposition and thoroughly investigated their composition with Rutherford backscattering spectrometry and optical measurements. The as-deposited stress in these thin films was also measured...[Show more]

CollectionsANU Research Publications
Date published: 2010
Type: Journal article
Source: Journal of Physics D: Applied Physics
DOI: 10.1088/0022-3727/43/33/335104


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