Skip navigation
Skip navigation

Stoichiometric Low Loss Tellurium Oxide Thin Films for Photonic Applications

Vu, Khu; Madden, Steve; Luther-Davies, Barry; Bulla, Douglas

Description

Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.

dc.contributor.authorVu, Khu
dc.contributor.authorMadden, Steve
dc.contributor.authorLuther-Davies, Barry
dc.contributor.authorBulla, Douglas
dc.coverage.spatialSydney Australia
dc.date.accessioned2015-12-10T22:22:08Z
dc.date.createdJuly 7-10 2008
dc.identifier.urihttp://hdl.handle.net/1885/52530
dc.description.abstractStoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE Inc)
dc.relation.ispartofseriesCOIN and Australian Conference on Optical Fibre Technology (COIN-ACOFT 2008)
dc.sourceProceedings of OECC/ACOFT 2008
dc.source.urihttp://www.iceaustralia.com/OECC_ACOFT2008/
dc.subjectKeywords: Fibers; Optical fibers; Optical materials; Oxide films; Tellurium; Tellurium compounds; Thick films; 1550 nm; As deposited; Low losses; Photonic applications; Propagation losses; Rf-sputtering; Tellurium oxides; Optical films
dc.titleStoichiometric Low Loss Tellurium Oxide Thin Films for Photonic Applications
dc.typeConference paper
local.description.notesImported from ARIES
local.description.refereedYes
dc.date.issued2008
local.identifier.absfor020504 - Photonics, Optoelectronics and Optical Communications
local.identifier.ariespublicationu9912193xPUB248
local.type.statusPublished Version
local.contributor.affiliationVu, Khu, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationMadden, Steve, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLuther-Davies, Barry, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBulla, Douglas, College of Physical and Mathematical Sciences, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.startpage2
local.identifier.doi10.1109/OECCACOFT.2008.4610455
dc.date.updated2015-12-09T09:00:46Z
local.identifier.scopusID2-s2.0-54049157805
CollectionsANU Research Publications

Download

File Description SizeFormat Image
01_Vu_Stoichiometric_Low_Loss_2008.pdf137.05 kBAdobe PDF    Request a copy


Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  22 January 2019/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator