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Stoichiometric Low Loss Tellurium Oxide Thin Films for Photonic Applications

Vu, Khu; Madden, Steve; Luther-Davies, Barry; Bulla, Douglas


Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.

CollectionsANU Research Publications
Date published: 2008
Type: Conference paper
Source: Proceedings of OECC/ACOFT 2008
DOI: 10.1109/OECCACOFT.2008.4610455


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