Stoichiometric Low Loss Tellurium Oxide Thin Films for Photonic Applications
Stoichiometric low loss Tellurium Oxide, TeO2, films have been produced by reactive RF sputtering. TeO2 films with propagation loss below 0.1dB/cm at 1550nm have been achieved in as deposited films.
|Collections||ANU Research Publications|
|Source:||Proceedings of OECC/ACOFT 2008|
|01_Vu_Stoichiometric_Low_Loss_2008.pdf||137.05 kB||Adobe PDF||Request a copy|