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A protective layer on As2S3 film for photo-resist patterning

Madden, Steve; Rode, Andrei V; Wang, Rongping; Bulla, Douglas; Luther-Davies, Barry; Choi, Duk-Yong

Description

We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown

dc.contributor.authorMadden, Steve
dc.contributor.authorRode, Andrei V
dc.contributor.authorWang, Rongping
dc.contributor.authorBulla, Douglas
dc.contributor.authorLuther-Davies, Barry
dc.contributor.authorChoi, Duk-Yong
dc.date.accessioned2015-12-10T22:14:56Z
dc.identifier.issn0022-3093
dc.identifier.urihttp://hdl.handle.net/1885/50387
dc.description.abstractWe have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown
dc.publisherElsevier
dc.sourceJournal of Non-crystalline Solids
dc.subjectKeywords: Chalcogenides; Inorganic compounds; Photoresistors; Photoresists; Planar waveguides; Alkaline developers; Chemical durability; Fabrication processes; Line edge roughnesses; Protective layers; Reflection coatings; Resist patterning; Resist patterns; Side-w Chalcogenides; Chemical durability; Planar waveguides; Processing; Vapor phase deposition
dc.titleA protective layer on As2S3 film for photo-resist patterning
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume354
dc.date.issued2008
local.identifier.absfor020406 - Surfaces and Structural Properties of Condensed Matter
local.identifier.absfor020504 - Photonics, Optoelectronics and Optical Communications
local.identifier.absfor020401 - Condensed Matter Characterisation Technique Development
local.identifier.ariespublicationu9912193xPUB202
local.type.statusPublished Version
local.contributor.affiliationChoi, Duk-Yong, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationMadden, Steve, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationRode, Andrei V, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationWang, Rongping, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationBulla, Douglas, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationLuther-Davies, Barry, College of Physical and Mathematical Sciences, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.issue47-51
local.bibliographicCitation.startpage5253
local.bibliographicCitation.lastpage5254
local.identifier.doi10.1016/j.jnoncrysol.2008.05.067
dc.date.updated2016-02-24T12:14:47Z
local.identifier.scopusID2-s2.0-55549085833
CollectionsANU Research Publications

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