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A protective layer on As2S3 film for photo-resist patterning

Choi, Duk-Yong; Madden, Steve; Rode, Andrei V; Wang, Rongping; Bulla, Douglas; Luther-Davies, Barry

Description

We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
URI: http://hdl.handle.net/1885/50387
Source: Journal of Non-crystalline Solids
DOI: 10.1016/j.jnoncrysol.2008.05.067

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