A protective layer on As2S3 film for photo-resist patterning
We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown
|Collections||ANU Research Publications|
|Source:||Journal of Non-crystalline Solids|
|01_Choi_A_protective_layer_on_As2S3_2008.pdf||119.43 kB||Adobe PDF||Request a copy|
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