Plasma etching of As2S3 films for optical waveguides
Choi, Duk-Yong; Madden, Steve; Rode, Andrei V; Wang, Rongping; Luther-Davies, Barry
Description
Chalcogenide glasses are good candidate materials for ultra-fast non-linear optic devices. In this work, we present the photolithographic process and the plasma etching of arsenic tri-sulphide (As2S3) film. The films were deposited on thermally oxidized silicon substrates by ultra-fast pulsed laser deposition. To protect As2S3 film from photo-resist developer, thin resist layer ∼100-200 nm was remained on the UV exposed area by controlling resist development time. After removing the protective...[Show more]
Collections | ANU Research Publications |
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Date published: | 2008 |
Type: | Journal article |
URI: | http://hdl.handle.net/1885/50334 |
Source: | Journal of Non-crystalline Solids |
DOI: | 10.1016/j.jnoncrysol.2008.01.014 |
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01_Choi_Plasma_etching_of_As2S3_films_2008.pdf | 386.03 kB | Adobe PDF | Request a copy |
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