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Plasma etching of As2S3 films for optical waveguides

Choi, Duk-Yong; Madden, Steve; Rode, Andrei V; Wang, Rongping; Luther-Davies, Barry

Description

Chalcogenide glasses are good candidate materials for ultra-fast non-linear optic devices. In this work, we present the photolithographic process and the plasma etching of arsenic tri-sulphide (As2S3) film. The films were deposited on thermally oxidized silicon substrates by ultra-fast pulsed laser deposition. To protect As2S3 film from photo-resist developer, thin resist layer ∼100-200 nm was remained on the UV exposed area by controlling resist development time. After removing the protective...[Show more]

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
URI: http://hdl.handle.net/1885/50334
Source: Journal of Non-crystalline Solids
DOI: 10.1016/j.jnoncrysol.2008.01.014

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