Skip navigation
Skip navigation

Plasma etching of As2S3 films for optical waveguides

Madden, Steve; Rode, Andrei V; Wang, Rongping; Luther-Davies, Barry; Choi, Duk-Yong


Chalcogenide glasses are good candidate materials for ultra-fast non-linear optic devices. In this work, we present the photolithographic process and the plasma etching of arsenic tri-sulphide (As2S3) film. The films were deposited on thermally oxidized silicon substrates by ultra-fast pulsed laser deposition. To protect As2S3 film from photo-resist developer, thin resist layer ∼100-200 nm was remained on the UV exposed area by controlling resist development time. After removing the protective...[Show more]

CollectionsANU Research Publications
Date published: 2008
Type: Journal article
Source: Journal of Non-crystalline Solids
DOI: 10.1016/j.jnoncrysol.2008.01.014


File Description SizeFormat Image
01_Choi_Plasma_etching_of_As2S3_films_2008.pdf386.03 kBAdobe PDF    Request a copy

Items in Open Research are protected by copyright, with all rights reserved, unless otherwise indicated.

Updated:  19 May 2020/ Responsible Officer:  University Librarian/ Page Contact:  Library Systems & Web Coordinator