The Application and Limitations of PECVD for Silicon-based Photonics
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Description
This thesis presents results on the applications and limitations of plasma enhanced chemical vapour deposition for silicon-based photonics, with an emphasis on optical microcavities for the control of light emission from silicon nanocrystals. ¶ ...
Collections | Open Access Theses |
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Date published: | 2005 |
Type: | Thesis (PhD) |
URI: | http://hdl.handle.net/1885/48197 |
DOI: | 10.25911/5d7a2bb70d9fb |
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File | Description | Size | Format | Image |
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01front.pdf | 358.5 kB | Adobe PDF | ||
02whole.pdf | 3.8 MB | Adobe PDF |
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