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Ga Cleaning of Al2O3 Substrate: Low Coverage Adsorption of Ga on a Hydrogen-Contaminated &alpha-Al2O3(0001) Surface

Yang, Rui; Rendell, Alistair

Description

The low coverage adsorption of gallium on a hydrogen-contaminated Al-terminated α-Al2O3(0001) surface is studied theoretically using first-principles density functional calculations with periodic boundary conditions. Initial computations to form the hydr

dc.contributor.authorYang, Rui
dc.contributor.authorRendell, Alistair
dc.date.accessioned2015-12-08T22:38:29Z
dc.identifier.issn1932-7447
dc.identifier.urihttp://hdl.handle.net/1885/35834
dc.description.abstractThe low coverage adsorption of gallium on a hydrogen-contaminated Al-terminated α-Al2O3(0001) surface is studied theoretically using first-principles density functional calculations with periodic boundary conditions. Initial computations to form the hydr
dc.publisherAmerican Chemical Society
dc.sourceJournal of Physical Chemistry C
dc.subjectKeywords: Adsorption; Boundary conditions; Chemical cleaning; Contamination; Density functional theory; Gallium; Hydrogen; Physisorbed hydrogen; Surface adhesion; Alumina
dc.titleGa Cleaning of Al2O3 Substrate: Low Coverage Adsorption of Ga on a Hydrogen-Contaminated &alpha-Al2O3(0001) Surface
dc.typeJournal article
local.description.notesImported from ARIES
local.identifier.citationvolume111
dc.date.issued2007
local.identifier.absfor030701 - Quantum Chemistry
local.identifier.ariespublicationU3594520xPUB129
local.type.statusPublished Version
local.contributor.affiliationYang, Rui, College of Engineering and Computer Science, ANU
local.contributor.affiliationRendell, Alistair, College of Engineering and Computer Science, ANU
local.description.embargo2037-12-31
local.bibliographicCitation.issue8
local.bibliographicCitation.startpage3384
local.bibliographicCitation.lastpage3392
local.identifier.doi10.1021/jp063931r
dc.date.updated2015-12-08T10:08:23Z
local.identifier.scopusID2-s2.0-33947510590
CollectionsANU Research Publications

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